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Chemistry and Lithography, by Uzodinma Okoroanyanwu
Download Ebook Chemistry and Lithography, by Uzodinma Okoroanyanwu
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Chemistry and Lithography provides a comprehensive treatment of the chemical phenomena in lithography in a manner that is accessible to a wide readership. The book presents topics on the optical and charged particle physics practiced in lithography, with a broader view of how the marriage between chemistry and optics has made possible the print and electronic revolutions of the digital age. The related aspects of lithography are thematically presented to convey a unified view of the developments in the field over time, from the very first recorded reflections on the nature of matter to the latest developments at the frontiers of lithography science and technology.
Part I presents several important chemical and physical principles involved in the invention and evolution of lithography. Part II covers the processes for the synthesis, manufacture, usage, and handling of lithographic chemicals and materials. Part III investigates several important chemical and physical principles involved in the practice of lithography. Chemistry and Lithography is a useful reference for anyone working in the semiconductor industry.
- Sales Rank: #3960077 in Books
- Published on: 2011-03-08
- Original language: English
- Number of items: 1
- Dimensions: 10.30" h x 2.10" w x 7.20" l, 4.35 pounds
- Binding: Hardcover
- 861 pages
About the Author
Uzodinma Okoroanyanwu is a Senior Member of Technical Staff in the Technology Research Directorate of GlobalFoundries, a subsidiary of AMD. Since joining AMD in 1997, his research interests have spanned KrF-, ArF-(dry and immersion), F2-, EUV lithographic process technologies, organic electronics, and electrochemistry. He was a research scientist (on assignment from AMD) at IMEC in Belgium between 2002 and 2004, at Physikalische Chemie Fachberi, Universitat Oldenburg, Germany in 2001, and in Fujistu Laboratories in Mie, Japan in 1998. He has published over 100 scientific and technical papers covering fundamentals of resist materials science and technology, resist process integration in device manufacture, microlithography, polymer chemistry and physics, gas phase kinetics, organic electronics, and electrochemistry. He holds 26 U.S. patents. A two-time recipient of AMD s Corporate Technical Achievement Award, as well as a recipient of the Semiconductor Research Corporation Technical Excellence Award, he is a member of American Chemical Society, American Association for the Advancement of Science, and Society of Photo-Imaging and Instrumentation Engineers. He holds the following degrees from The University of Texas at Austin: Ph.D. in physical chemistry (1997), M.S. in chemical engineering (1995), M.A. in physical chemistry (1994), B.S. in chemistry and chemical engineering (1991).
Most helpful customer reviews
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Book review
By Anthony
This book is great as an overview regarding the chemistry of Lithography. I wish they presented more examples of products and how they are made. I recommend to students entering the field of lithography
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